Prof. Ling Zang
USTAR Office: Rm5543 SMBB building,
Tel. 801-587-1551
Department Office: Rm209 CME building,
Tel. 801-585-0966
Fax: 801-585-0625
Email: lzang@eng.utah.edu
Mailing Address:
SMBB Building, Room 5543
36 South Wasatch Dr., Salt Lake City, UT 84112
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We have
all kinds of instruments and equipments necessary for
the proposed research projects, either directly
available in our own labs or through the shared,
centralized facilities on campus. Here is a list of
the major instruments currently installed in our labs:
I.
Microscopy |
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1. Veeco Aurora
III near-field scanning optical microscope
(NSOM): a combined system adaptable for NSOM,
AFM, and scanning confocal modes.
2. Veeco MultiMode V scanning probe microscope
(SPM): a combined system suited for atomic
force microscope (AFM) and scanning tunneling
microscope (STM).
3. Leica DMi8
optical/fluorescence/cross-polarized
microscope: a fully-integrated inverted
microscope, equipped with high resolution CCD
camera, a computer-controlled (temperature
programmed) heating stage, and a collimated
fiber based light source from a mercury lamp.
It is highly adaptable to various light
sources including lasers, spectrometers,
electrical measurement units, enabling
combined electrical and optical
characterization.
4. Nikon Labophot-2 optical microscope.
All microscopy systems are anchored on
self-leveling vibration-isolating tables,
allowing for high resolution scanning (step
< 0.1 nm) for both microscopy and
spectroscopy measurement.
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II.
Spectroscopy and Spectrometry
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1. Perkin-Elmer
Lambda 25 UV-vis spectrophotometer: fully
functional for solution and solid state
measurements.
2.
Perkin-Elmer LS 55 fluorometer: fully
functional for solution and solid state
measurements, with temperature control.
3. Princeton Instrument Acton PIXIS:400
Digital CCD Camera System: for
high-resolution imaging and spectroscopy,
deep cooled platform (up to -90 C for
highest sensitivity) with back-illuminated
deep depletion technology.
4. Acton SP-2300i Imaging Spectrograph
system: with 300 mm focal length, micrometer
controlled entrance slit, holographic
grating (68x68 mm, 2400 G/mm, visible
optimized).
5. Ocean Optics USB4000 CCD based
fluorometer: highly adaptable for fiber
based microscopy imaging and spectral
recording, attached with an open sample
holder suited for both solution and solid
measurements.
6.
Thermo
Scientific gas chromatograph-mass
spectrometer (GC-MS) system: model #
Thermo Trace 1310/ISQ QD. This
instrument is equipped integrated
electronic gas control (IEC) allowing for
constant or programmable flow
and pressure control.
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III.
Micro-Electrical Characterization and
Semiconductor Analysis |
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1. Agilent
4156C Precision Semiconductor Parameter
Analyzer: highly accurate laboratory bench top
parameter analyzer for advanced device
characterization, PC controlled through
EasyEXPERT Software, 4x High-resolution SMU,
2xVSU and 2xVMU, measurement resolution of 1
femto-amp (10-15 A) and 0.2 microvolt ,
measurement scale of +/- 200 Volts and +/- 1
Amp.
2. Signatone S-1160 Probe Station: 4 probes
for multi-end device characterization,
equipped with Motic Microscope for poisoning
and a CCD camera for in situ imaging of the
device. The whole system is housed in a
shielding dark box to eliminate the RF noise
and/or scattering light for low current and/or
light sensitive measurements.
3. Keithley 6487 Picoammeter/Voltage Source:
for high resolution current and voltage
measurements.
4. Keithley 236 Source Unit: fully
programmable for sourcing and measuring
voltage or current simultaneously, with 10fA
and 10V measurement resolution.
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IV. Materials Fabrication and
Characterization |
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1. Ladd
Digital Thermal Evaporator 30008BT: with two
evaporation sources for sequential thin film
coating of metals, inorganic compounds or
small organic molecules without breaking
ultrahigh vacuum, different geometries of
uniform coating available upon use of
shadow-masks on rotating samples, fully
programmable control of coating thickness down
to a resolution of angstrom.
2. Denton DESK IV sputter coater: for thin
film coating of metals on various substrates,
different geometries of coating available upon
use of shadow-masks, fully programmable
control of coating thickness up to a
resolution of angstrom.
3. DataPhysics OCA 15EC Video-Based Optical
Contact Angle Meter: software controlled
measurement and analysis of the static and
dynamic contact angle, determination of the
wettability of solid surfaces, the surface
free energy and their components of solids as
well as the calculation of the surface and
interfacial tension based on the analysis of
the drop shape.
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V.
Optical/Laser Sources |
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1. Melles Griot
argon ion laser (35LAP431-208): tunable
wavelength 457-514 nm, with maximal at 488 nm
(125 mW) and 514 nm (130 mW), linear polarized
(250:1), beam diameter 0.72 mm.
2. Melles Griot HeNe laser (25LHP151-249): 5
mW, 633 nm, linear polarized (500:1), beam
diameter 0.8 mm.
3. Stanford Research Systems NL-100 Nitrogen
pulsed laser: 337 nm, pulse width (FWHM)
<3.5 ns, pulse energy 170 J, peak power 45
kW, average power 3 mW (at 20 Hz), beam size 3
?7 mm, 1 to 20 Hz with internal trigger.
4. Spectral Physics Q-Switched pulsed laser
(J40-BL6S-532Q): 532 nm, 2.7 W@ 35kHz, pulse
width 8 ns, J40 power supply chassis with
single 40 W FCbar diode module, linear
polarized (100:1), beam diameter 0.6-0.7 mm.
5. Newport Oriel Collimated 1.5 inch ARC Lamp
Source (model 66477): 200 W mercury lamp or
150 W Xe lamp, aspheric condensers for uniform
beam, collimated output via fiber.
6. Newport Oriel AM1.5G sun simulator (model
96000): 150 W Xe lamp installed, Air Mass 1.5
Global (AM1.5G) filter installed for
generating approximately 1.3 sun output.
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VI.
Wet Chemical Lab and Facilities |
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The
wet-chemical lab is primarily used for organic
synthesis, materials preparation and
fabrication, solution based spectral
measurement, and other wet-chemical
processing. This lab is fully equipped with
all necessary equipments, tools and hardwares,
including spin-coaters, rotary evaporator,
Schlenk systems, water-circulation thermostat,
multiple vacuum ovens, pumps, centrifugators,
sonicators, balances, etc.
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VII.
Other On-Campus Resources |
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Broad
range of facilities for nanoscale fabrication
and characterization are available through the
Nanofab network of UU: http://www.nanofab.utah.edu/
Specifically,
1. high resolution TEM, SEM and XRD from the
MSE Materials Characterization Facility: http://sem.coe.utah.edu/
2. high resolution SEM (for direct imaging
of non-conducting materials
with feature size down to 2 nm) from the
Physics Department Scanning
Electron Microscopy Laboratories: http://www.physics.utah.edu/facilities/sem.html
3. XPS, AES, spectroscopic ellipsometer,
stylus and optical profilometers from the
new Surface & nano Imaging lab:
http://www.nanofab.utah.edu/index.php?n=Main.SurfaceAmpNanoImaging
4. full range micro-fabrication and
characterization facilities from the UU
Microfab Lab: http://microfab.utah.edu/
5.broad range of NMR, Mass spectrometry and
XRD facilities from the Chemistry
Department:
http://www.chem.utah.edu/research/facilities/index.html
6. full range laser sources (both CW and
pulsed) and spectrometers from the Dixon
Laser Institute:
http://www.physics.utah.edu/laser/
7. full range bio-related microscopy imaging
and spectroscopy facilities from the UU
Health Science Center Core Research
Facilities: http://www.cores.utah.edu/Index.htm
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